Optical lithography in class 100 (ISO 5)

Mask aligner Carl Süss

Quintel mask aligner with front / back alignment

Heidelberg laserwriter with 800 nm head and gray tones.

Thin film deposition systems in class 10000 (ISO 7):

DC sputtering

Leybold RF Sputtering

Thermal and electron gun evaporator

Deep Reactive Ion Etching Oxford PlasmaLab 100 Cobra. The laboratory is particle control

Molecolar Beam Epitaxy with AFM in ultra high vacuum

Sputtering for magnetic materials

Rapid Thermal Annealing Furnaces

Thermal evaporators

PECVD reactor

Plasma etcher

Chemical hood for cleaning substrates and producing silicon nanostructures

Woollam ellipsometer.

Nanolithography and Focused Ion Beam:

Dual Beam ESEM FEG Quanta 3D ™ equipped with Ga + ion beam, four Kleindiek Nanoteknik nanomanipulators, two Gas Injector Systems, one at Pt and one at SiOx and NanoPattern Generator System by J.G. Nabity for nanolithography.

Inspect F ™ FEG equipped with EDAX microanalysis and NanoPattern Generator System by J.G. Nabity for nanolithography.

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