The laboratory collects equipment for materials preparation (sputtering, arc melting, ball milling) and for materials characterisation (x-ray diffraction, differential scanning calorimetry).

For the preparation of materials, the laboratory is equipped with a sputtering in high vacuum, with 4 cathodes (2 dc and 2 rf) and one etching position. Single- and multi-target co-deposition is possible, with argon, nitrogen or oxygen plasma, or with a mixture of these gases. The sample can be heated during deposition up to 600 °C. Maximum sample size is 4 cm x 4 cm.

Moreover, in the laboratory there are an arc furnace for melting metals and alloys and a ball milling system for mechanical milling and alloying.

The laboratory is also equipped with materials characterisation techniques such as X-ray diffractometry (XRD) and differential scanning calorimetry (DSC)